Basic Product Details:

Molybdenum Niobium Alloy Sputtering Targets , crafted meticulously by SHAANXI CXMET TECHNOLOGY CO., LTD, epitomize cutting-edge innovation and precision engineering. These targets are indispensable components in thin film deposition processes, offering unparalleled performance and reliability.

Product Standards:

Our Molybdenum Niobium Alloy Sputtering Targets adhere to stringent industry standards, ensuring consistency and quality in every batch. We meticulously monitor manufacturing processes to meet or exceed customer expectations.Overall, Molybdenum Niobium Alloy Thin Film Deposition Targets  offer exceptional performance, reliability, and versatility for thin-film deposition applications, making them indispensable tools for the advancement of semiconductor technology, electronics manufacturing, and optical device fabrication. With their precise engineering and tailored properties, these targets contribute to the development of cutting-edge devices and technologies in various industries.

Basic Parameters:

• Composition: Molybdenum-Niobium Alloy
• Purity: ≥ 99.9%
• Density: 10.2 g/cm³
• Melting Point: 2,468°C
• Shape: Discs, Plates, or Customized Shapes
• Dimensions: Customizable according to customer specifications

Product Attributes:

• High Purity: ≥ 99.9% purity ensures minimal impurities for superior thin film deposition.
• Excellent Thermal Stability: With a melting point of 2,468°C, our targets withstand high-temperature processes with ease.
• Superior Sputtering Efficiency: Optimized composition and precise manufacturing result in exceptional sputtering performance.
• Enhanced Uniformity: Homogeneous composition ensures consistent film deposition across substrates.
• Exceptional Mechanical Strength: Robust structure withstands rigorous sputtering processes, minimizing target degradation.

Product Functions:

Molybdenum Niobium Alloy Thin Film Deposition Targets serve as crucial components in physical vapor deposition (PVD) processes, enabling the deposition of thin films with exceptional uniformity and purity. These targets are utilized in various applications across industries ranging from semiconductor manufacturing to optical coatings.Molybdenum niobium amalgam sputtering targets are fundamental components utilized in thin-film statement forms, especially in the fabricating of semiconductor gadgets, flat-panel shows, optical coatings, and other progressed electronic and optical applications. These targets play a critical role in physical vapor deposition (PVD) techniques, where material from the target is deposited onto a substrate to create thin films with precise thickness, composition, and properties.

Features:

• Customizable Shapes and Dimensions: Tailored to meet specific application requirements.
• High Purity and Homogeneity: Ensures consistent film deposition and performance.
• Exceptional Thermal Stability: Withstands high-temperature processes without degradation.
• Superior Sputtering Efficiency: Maximizes material utilization and deposition rates.

Advantages and Highlights:

• Premium Quality: Manufactured to the highest standards, ensuring reliability and performance.
• Customization Options: Tailored to meet unique customer specifications.
• Exceptional Performance: Delivers consistent and uniform thin film deposition.
• Comprehensive Support: Complete test reports and certifications provided for quality assurance.

Application Areas:

• Semiconductor Manufacturing
• Optical Coatings
• Solar Cells
• Thin Film Batteries
• Display Technologies
• Architectural Glass Coatings

OEM Services:

SHANXI CXMET TECHNOLOGY CO., LTD offers comprehensive OEM services, collaborating with customers to develop tailored solutions to meet specific requirements. From custom shapes and dimensions to unique compositions, we strive to fulfill diverse customer needs.

FAQs:

1. What is the purity of your Molybdenum Niobium Alloy Thin Film Coating Targets?
   • Our targets boast a purity of ≥ 99.9%, ensuring minimal impurities for superior performance.
2. Can you customize the dimensions and shapes of the targets?
   • Yes, we offer customizable shapes and dimensions to meet specific customer requirements.
3. What applications are your targets suitable for?
   • Our targets find applications in semiconductor manufacturing, optical coatings, solar cells, and more.

Material Properties and Details:

• Molybdenum-Niobium Alloy Composition: Precise control of alloy composition ensures optimal sputtering performance.
• High Thermal Conductivity: Facilitates efficient heat dissipation during sputtering processes.
• Corrosion Resistance: Resistant to degradation in harsh environments, ensuring long-term reliability.

SHAANXI CXMET TECHNOLOGY CO., LTD:

As a leading manufacturer and supplier of Molybdenum Niobium Alloy Thin Film Coating Targets, SHAANXI CXMET TECHNOLOGY CO., LTD is committed to delivering excellence in quality and service. Our targets are accompanied by various standard certifications and complete test reports, providing customers with assurance of product reliability. We offer extensive OEM support, fast delivery, and meticulous packaging to ensure product integrity during transit. For inquiries or orders, please contact us at sales@cxmet.com. Choose SHANXI CXMET for unparalleled quality and reliability in sputtering targets.